Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

Yi H; Bao XY; Zhang J; Bencher C; Chang LW; Chen XY; Tiberio R; Conway J; Dai HX; Chen YM; Mitra S; Wong HSP

Advanced Materials, Vol.24, No.23, 3107-3114, 2012

DOI10.1002/adma.201200265 Export Citation

Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

Yi H, Bao XY, Zhang J, Bencher C, Chang LW, Chen XY, Tiberio R, Conway J, Dai HX, Chen YM, Mitra S, Wong HSP

Keywords:block copolymers;directed self-assembly;small topographical templates;contact hole patterning