Metal (Cu and Ni) micropatterns were electrolessly fabricated on glass substrates using ink-jetted ZnO thin films as templates and without employing photoirradiation. The metal micropatterns conformed to the ZnO templates and had line widths as narrow as 45 mu m. The line width depended on the wettability of the glass substrate and on the viscosity of the precursor solution of zinc nitrate and poly(vinylpyrrolidone).