화학공학소재연구정보센터
Current Applied Physics, Vol.12, No.6, 1591-1595, 2012
Use of negative capacitance to simulate the electrical characteristics in double-gate ferroelectric field-effect transistors
The surface potential and drain current of double-gate metal-ferroelectric-insulator-semiconductor (MFIS) field-effect transistor were investigated by using the ferroelectric negative capacitance. The derived results demonstrated that the up-converted semiconductor surface potential and low subthreshold swing S = 34 (<60 mV/dec) can be realized with appropriate thicknesses of ferroelectric thin film and insulator layer at room temperature. What's more, a reduction gate voltage about 260 mV can be reached if the ON-state current is fixed to 600 mu A/mu m. It is expected that the derived results can offer useful guidelines for the application of low power dissipation in ongoing scaling of FETs. (C) 2012 Elsevier B.V. All rights reserved.