Webs of Kapton 200-H and Upilex-S polyimide films were treated using oxygen plasma prior to sequential sputter deposition of chromium and copper in a roll metallization system. Two plasma system configurations were employed for treatment. In one configuration, the sample traveled downstream from a microwave plasma; in the other, the web moved through a DC-generated glow discharge. For the DC-glow treatment, the potential difference between the plasma and the web, phi(f), and relative ion densities, n+, were measured at various values of chamber pressure and DC power using a Langmuir probe. Although samples treated downstream from the microwave plasma were not subjected to bombardment by energetic ions, psi(f) for the DC-glow operating conditions was between 5 and 13 eV. For both films, advancing DI water contact angles of less than 20-degrees were achieved using both modes of treatment. Contact angles for untreated films were greater than 60-degrees. However, 90-degrees peel tests yielded values of 15 to 20 g/mm for microwave plasma treatments and 40 to 60 g/mm for DC-glow treatment. Peel values for untreated Kapton and Upilex films were about 25 g/mm. High-resolution X-ray photoelectron spectroscopy in the C1s region for Kapton film surfaces treated downstream from the microwave plasma showed increases in carbonyl groups, with concentrations inversely proportional to web speed. In contrast, DC-glow modification was due mainly to formation of carboxylates with a small increase in carbonyl component. It is proposed that treatment downstream from the microwave plasma results in formation of a weak boundary layer at the polyimide surface. Ion bombardment occurring in the DC-plasma configuration results in relatively more crosslinking at the polymer surface. Furthermore, adhesion between the sputter-deposited chromium and the DC-glow modified polyimide improved with increasing values of psi(f)n+.