| 초록 |
Self-assembly of block copolymer (BCP) thin films is of interest in nanoscience due to their potential to be employed in nanopatterning. For BCP nanopatterning, the vertical orientation of BCP is necessary, which is only realized when the energy of the substrate and interface is neutral for both blocks. In this study, we propose a strategy to neutralize the interface using the air-water interfacial layer (AWIL) of short-chain BCPs. The short-chain BCPs form a randomly segregated layer at the air/water interface with molecular-level-thick, which can be transferred easily onto any substrates. The BCP thin films on the AWIL-coated substrate have a neutral interface due to the random segregation of AWIL and can form vertical domain orientations in thin films. In addition, the free surface of BCP thin films can be neutralized with AWIL-coated elastomers, enabling a highly aligned sub-10 nm nanopatterning by combining a shearing method. |
