| 학회 |
한국고분자학회 |
| 학술대회 |
2017년 가을 (10/11 ~ 10/13, 제주컨벤션센터) |
| 권호 |
42권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Synthesis and characterization of a polyimide from a precursor containing photosensitive group |
| 초록 |
Polyimides(PI) have used to various applications especially in microelectronic industry due to their excellent thermal, electrical, and mechanical properties. By introducing photosensitivity into PI, process for photolithographic patterning is simplified much more than the conventional process using photoresists. In this study, synthesis and characterization of PI from PAE (poly amic ester) containing photosensitive group were carried out by comparing those of PI from PAA (poly amic acid). The properties of PI precursors will be discussed in terms of viscosity, GPC, NMR and of the imidized film were observed by means of thickness, FTIR and UTM. |
| 저자 |
박유진, 문유경, 박노균, 김윤호, 원종찬, 김진수
|
| 소속 |
한국화학(연) |
| 키워드 |
Polyimide; PSPI; PAE
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| E-Mail |
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