| 학회 | 한국재료학회 |
| 학술대회 | 2017년 봄 (05/17 ~ 05/19, 목포 현대호텔) |
| 권호 | 23권 1호 |
| 발표분야 | G. 나노/박막 재료 분과 |
| 제목 | 원자층 증착법을 이용한 증착 온도 변화에 따른 플루오린 도핑 산화아연 박막의 특성 변화 연구 (Influence of deposition temperature on the properties of F-doped ZnO films using atomic layer deposition) |
| 초록 | We investigated the influence of deposition temperature on the properties of F-doped ZnO thin films using atomic layer deposition (ALD). The deposition temperature effects on the structural, electrical, and optical properties of F-doped ZnO thin films. F-doped ZnO thin films by ALD were carried out with home-made fluorine source at a various deposition temperature from 100oC to 200oC. The grain growth orientation was found to change significantly as the change of deposition temperature. Through the increased deposition temperature, the prefer growth orientation was changed from c-axis to a-axis and then from a-axis to c-axis. The electrical properties of F-doped ZnO films were enhanced by an increase of deposition temperature. Along with the increase in the deposition temperature, the optical transmittance of the films increased slightly. Therefore, the properties of F-doped ZnO thin films could be controlled by an adjustment of deposition temperature. Acknowledgement: This work was supported by the National Research Foundation of Korea(NRF) grant funded by the Korea government(MSIP) (No. 2015R1A2A1A15054541). |
| 저자 | 강경문, 한우제, 박형호 |
| 소속 | 연세대 |
| 키워드 | F-doped ZnO; deposition temperature; transparent conducting oxide(TCO); atomic layer deposition(ALD) |
