| 초록 |
Ceramic oxide coatings are used in a broad range of microelectronic equipment applications, where they enhance chemical, corrosion, erosion and abrasion resistance. In this study, thick Y2O3 coatings have been produced by conventional plasma spraying and room temperature aerosol deposition, and their microstructural features and halogen-plasma resistance have been evaluated. The plasma-sprayed Y2O3 coating was characterized by a splat quenched microstructure which contained a large amount of micro-defects including inter-splat pores and intra-splat cracks. In contrast, the aerosol-deposited Y2O3 coating exhibited a very dense microstructure where submicron-sized particles were strongly bonded each other by a high energetic impingement in deposition. Halogen-plasma erosion resistance using CF4/O2 gas showed no significant difference in both plasma-sprayed and aerosol-deposited Y2O3 coatings. However, the resulting reaction products in the aerosol-deposited coating had a much smaller size, compared with those in the plasma-sprayed coating. |
