| 초록 |
In this paper, we introduce a new cost-effective fabrication method called Scaling down process using transparent shape memory polymer (SMP) as a nano imprint lithography(NIL) resist that is based on a thermal nano imprinting method and temperary-memory effect(TME). Nano patterns of SMP in the form of line-and-space are first generated by NIL at a temperature higher than the transition temperature (Ttrans) of the SMP, and the patterned SMP has cooled below the Ttrans. After that, the patterned SMP underwent a controlled scaling down process near the Ttrans while heating whole SMP or partially heating. As a result of this controlled scaling down process, nano scale patterns of various sizes are obtained depending on the heating temperature. In this way, this new method can fabricate nano-scale patterns both simply and at an affordable price. SMP is also widely applied to other unconventional lithographic processes such as in UV assist lithography due to its transparent property. |
