| 학회 | 한국고분자학회 |
| 학술대회 | 2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터) |
| 권호 | 43권 2호 |
| 발표분야 | 고분자합성 |
| 제목 | Synthesis and negative photopatterning of the new photosensitive poly(amic ester) (ODPA-BBPA-HEMA) resin |
| 초록 | We have synthesized photosensitive poly(amic ester) (ODPA-BBPA-HEMA) as photopatternable precursor of polyimide by using previously known synthetic methods. 4,4’-Oxydiphthalic anhydride (ODPA), and 3,3’, 5,5’-tetramethyl-4,4’-bis(p-aminophenoxyl)biphenyl (BBPA), were used as monomers, dianhydried and diamine, respectively. Synthetic compound was characterized by 1H NMR, GPC, viscometer and EA. Additionally, we investigated the photopattanability and thermal shrinkage thereof. |
| 저자 | 이중헌, 서영범, 문유경, 김진수, 김윤호, 원종찬 |
| 소속 | 한국화학(연) |
| 키워드 | photosensetive; polyimide |
