| 초록 |
For the preparation of a patterned polymer gate insulator, a novel method of photo-crosslinking the polymer insulator was developed. Firstly, the hydroxyl group containing polyimides (6FDA-6FHAB and DOCDA-6FHAB) were synthesized with a simple one step condensation polymerization using the monomers, 5,5'-(perfluoropropane-2,2-diyl)diisobenzofuran-1,3-dione (6FDA) , 5-(2,5-dioxytetrahydrofuryl)3-methly-3-cyclohexene-1-2-dicarboxylic anhydride (DOCDA), and 5,5'-(perfluoro propane-2,2-diyl)bis(2-aminophenol) (6FHAB). Synthesized polyimides were crosslinked by DPEHA as semi-IPN photo-crosslinking agent. Thin film properties of photo-crosslinked polyimides were characterized such as chemical structures, thermal stability, and capacitance, etc. Both crosslinked polyimide films showed low leakage current densities in MIM devices. Especially, 6FDA-6FHAB showed very low leakage current density less than 8.53x10-10 A/cm2 at 2 MV/cm. Detailed synthetic routes and conditions will be presented. |
