| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 봄 (04/12 ~ 04/13, 대전컨벤션센터) |
| 권호 |
37권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Dually Patterned Self-assembled Monolayer via Silicon-containing Block Copolymer Lithography on Gold Substrate and Their Applications |
| 초록 |
Chemical surface nanostructures were obtained using self-assembled monolayer patterned by microcontact printing or nanoimprint technique. But these approaches are inadequate at the micron- and sub-micron scales. Serial techniques like electron-beam lithographies achieve nanoscale pattern definition but are limited in their ability to define large area patterns. In this study, we use Si-containing block copolymer lithography for fabricating highly ordered nanoporous SiO2 structures on gold substrates. The materials with silanol end groups self-assembled on the SiO2 surface, while the compounds with the thiol groups on the gold surface. This patterning method not only form ordered nanostructures over large area, but also control surface property by changing functional groups of self-assembled molecules. These dually patterned surfaces would be further utilized for immobilization materials and highly useful for the high throughput biosensor and array applications. |
| 저자 |
우승아, 최수영, 구세진, 김진백
|
| 소속 |
한국과학기술원 |
| 키워드 |
Self-assembled Monolayer; Block Copolymer; Dual Patterning
|
| E-Mail |
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