| 초록 |
Photolithography has been a conventional technology for the micro-/nano-fabrication for several decades. However, the fabricated feature sizes in photolithography have been limited by the wavelength and interference of light. As a potential alternative to smaller patterns, soft lithography using soft elastic materials has been spotlighted. In this work, we will report the fabrication of a variety of submicrometer scale patterns using microcontact printing, micromolding and nanoimprinting. The results confirmed that soft lithographic techniques have a great potential to fabricate finer scale patterns than the conventional photolithography. Acknowledgement: This work was supported by the Brain Korea 21 and a grant (M102KN010001-02KN1401-00212) from the Center for Nanoscale Mechartronics and Manufacturing of the 21st Century Frontier Research Program. |
