| 초록 |
Organic photovoltaic (OPV) have many advantage such as light weight, flexible, various applicability, low cost manufacturing. For the improving efficiency of this OPV device, new donor/acceptor material synthesis and maximized interfacial area between active materials has been studied. Several search groups introduced a nanoimprint lithography method for increasing interfacial area of OPV with a donor material of P3HT and a acceptor material of PCBM. However, this imprinting methods hard to obtain sub-20nm patterned master in a large area and general thermal nanoimprint method was disadvantages because of thermal damage of active materials. Here we present solvent-assisted nanoimprint (SANIL) method with PS-b-PDMS block copolymer self-assembly, which can realize sub-20nm nanopattern mask in a large area. Surface of imprinted P3HT was observed through SEM. We also compared the efficiency of the OPV cells between patterned and non-patterned structure. |
