| 학회 |
한국고분자학회 |
| 학술대회 |
2021년 가을 (10/20 ~ 10/22, 경주컨벤션센터) |
| 권호 |
46권 2호 |
| 발표분야 |
고분자구조 및 물성 |
| 제목 |
Hierarchical Self‐Assembly of Thickness‐Modulated Block Copolymer for Controlling Orientations inside Silicon Trenches |
| 초록 |
We study the orientation and ordering of nanodomains of a thickness‐modulated lamellar block copolymer (BCP) thin film at each thickness region inside a topological nano/micropattern of bare silicon wafers without chemical pretreatments. With precise control of the thickness gradient of a BCP thin film and the width of a bare silicon trench, we successfully demonstrate (i) perfectly oriented lamellar nanodomains, (ii) pseudocylindrical nanopatterns as periodically aligned defects from the lamellar BCP thin film, and (iii) half‐cylindrical nanostructure arrays leveraged by a trench sidewall with the strong preferential wetting of the PMMA block of the BCP. Our strategy has an advantage in fabricating diverse nanopatterns simultaneously compared to conventional BCP lithography utilizing chemical pretreatments. The proposed self‐assembly nanopatterning process can be used in next‐generation nanofabrication processes with minimized fabrication steps for low‐cost manufacturing techniques. |
| 저자 |
오영택, 이정우, 김시몬, 고영천, 박신, 이세기, 김봉훈
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| 소속 |
숭실대 |
| 키워드 |
Block copolymer; Thickness gradient; Directed self‐assembly; Graphoepitaxy; Nanolithography
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| E-Mail |
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