| 학회 |
한국고분자학회 |
| 학술대회 |
2002년 봄 (04/12 ~ 04/13, 서울대학교) |
| 권호 |
27권 1호, p.310 |
| 발표분야 |
특별 심포지엄 |
| 제목 |
Positive Photosensitive Polyimide with for a High-Aperture-Ratio TFT-LCD |
| 초록 |
Photosensitive polyimides have attracted much attention because brief processing steps are required to produce fine structures on substrate with conventional polyimide. However, most of photosensitive aromatic polyimide has dark color, which limits its wide application such as TFT-LCD with high aperture ratio. The present work was undertaken to synthesize colorless positive photosensitive polyimide from alicyclic dianhydride and aromatic diamine containing phenol moiety. And then the hydroxy group of polyimide was protected by di-tert-butyl-dicarbonate. This positive working polyimide showed remarkable solubility difference toward aq. TMAH(2.38%) when exposed to UV light in the presence of photo acid generator(PAG). Further, we have investigated properties of remained polyimide layer such as glaㄴs transition temperature, solubility, dielectric constant and transparency.
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| 저자 |
김효주1, 최길영2, 김광규*3, 김경준*, 조봉래**, 이미혜
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| 소속 |
1한국화학(연), 2*(주)LG 화학 기술(연), 3**고려대 |
| 키워드 |
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| E-Mail |
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