| 초록 |
Ultrathin Ag films, which are attractive owing to its extremely low resistance, relatively high transparency, excellent mechanical flexibility, and mature mass production have been reported as potential candidates to replace traditional ITO(Indium Tin Oxide). To achieve ultrathin Ag films, a nucleation-inducing seed layer with a mono-molecular adhesive(4-aminopyridine) is required to address the issue of irregular Ag islands growth.In this study, it was confirmed that the mono-molecular adhesive improved adhesion of Ag interfaces and wetting properties of Ag. This mono-molecular adhesive is expected to provide dense nucleation centers and suppress the growth of large metal islands during film deposition. After capping with molybdenum oxide(MoO3) anti-reflection layer, the resultant electrode exhibits an excellent optoelectrical performance with a sheet resistance of 12.5Ωsq-1 and transmittance of 90.1% in the 550nm wavelength. In addition, Ag thin films with mono-molecular adhesive have outstanding mechanical stabilites. The resistance changes fo the Ag thin films increased to 24.02% after 5,000 folding, but the Ag thin films with mono-molecular adhesive increased to 4.8%. |
