| 초록 |
By using intense flash light, we have assured sub-10 nm self-assembled nanopatterning with high χ block-copolymer in wafer-scale. With high χ block-copolymer, flash light has many advantages including reliability, fab-compatibility, and ultrafast process. Millisecond-level rapid photo-thermal process with high temperature enables large grain growth without thermal degradation or dewetting. Photo-thermal effects to block-copolymer self-assembly for highly ordered structures are identified based on the kinetics and thermodynamics. Flash light process is combined with graphoepitaxy to prove directed self-assembly over large area. Flash light nanopatterning can be intergrated with roll-to-roll process, and thereby can be widely used to next-generation nano-device applications; electronics, optoelectronics, sensors, catalysts, etc. |
