| 학회 |
한국화학공학회 |
| 학술대회 |
2015년 봄 (04/22 ~ 04/24, 제주 ICC) |
| 권호 |
21권 1호, p.120 |
| 발표분야 |
공정시스템 |
| 제목 |
Statistical variable selection of OES signal for identifying key process characteristics in plasma etching |
| 초록 |
Plasma etch is key process in semiconductor manufacturing and many research groups try to develop critical dimension shirinking and enhance uniformity. From OES signal, analyzing electron excitation energy can select several dominant wavelengths in plasma reaction. Therefore, excitation energy analysis and dimension reduction technique are applied. In this study, using this technique to analyze 2048 variable OES data sets, the number of selected variables can identify a minimal group of key wavelengths, with an acceptable for overall process. The procedure for variable selection in this study will provide valuable reference for sensor-related applications in semiconductor manufacturing. |
| 저자 |
하대근, 구준모, 박담대, 노현준, 유상원, 한종훈
|
| 소속 |
서울대 |
| 키워드 |
Semiconductor Manufacturing; Plasma etching; Variable Selection; Optical Emission Spectroscopy
|
| E-Mail |
|
| VOD |
VOD 보기 |
| 원문파일 |
초록 보기 |
