| 학회 |
한국고분자학회 |
| 학술대회 |
2021년 가을 (10/20 ~ 10/22, 경주컨벤션센터) |
| 권호 |
46권 2호 |
| 발표분야 |
고분자 가공/복합재료 |
| 제목 |
Novel Transfer-Printing Process for Block Copolymer Nanopatterns Using Chemically Modified Graphene |
| 초록 |
Among the various transfer-printing processes, a simple and primitive technique involves retrieving ultrathin nanomaterials, such as polymers, 2D materials, and quantum dots, floating on the surface of a liquid. In particular, this method has significant limitations as it is largely affected by the surface energy of a receiver substrate and inevitably generates numerous wrinkles during the printing process. In this work, we investigate a novel transfer-printing process for metal nanopattern arrays on chemically modified graphene (CMG) films using a block copolymer (BCP) nanotemplate and polydimethylsiloxane (PDMS) stamp. A metal nanopattern array fabricated with BCP lithography on a CMG film was thus successfully transferred to nonplanar (i.e., rough or curved) surfaces. The new transcription process method for nanomaterial thin films presented in this study is expected to be utilized for the development of various next-generation electronic/energy devices as it can be applied to flexible substrates or boards with complex 3D shapes. |
| 저자 |
고영천, 김은지, 선승원, 김시몬, 오영택, 황준표, 김봉훈
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| 소속 |
숭실대 |
| 키워드 |
transfer printing process; nanopatterning; block copolymer lithography; chemically modified graphene; polydimethylsiloxane stamp
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| E-Mail |
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