| 학회 | 한국공업화학회 |
| 학술대회 | 2018년 가을 (10/31 ~ 11/02, 제주국제컨벤션센터(ICC JEJU)) |
| 권호 | 22권 2호 |
| 발표분야 | 정밀화학_포스터 |
| 제목 | Synthesis and characterization of dimeric and trimeric benzotriazole for highly thermal-stable UV absorber. |
| 초록 | Ultraviolet light (UV, 280 nm - 400 nm) induces the formation of free radicals in the polymer, leading to photo-degradation such as reduced transmittance of light and yellowing. Therefore, a variety of organic UV absorbers have been studied to prevent photo-degradation of the polymer. However, most commercial UV absorbers have low thermal stability and therefore cannot be used in applications requiring high temperature process. In this study, we synthesized dimeric and trimeric benzotriazole UV absorbers based on excited state intramolecular proton transfer (ESIPT). UV absorbers based on ESIPT can release non-radiatively the absorbed UV energy through Keto-enol tautomerization. In addition, dimer and trimer with increased molecular weight show improved thermal stability compared to monomer. The properties of UV absorber were analyzed through UV/vis spectroscopy, thermogravimetric analysis (TGA) and solubility test in organic solvents. |
| 저자 | 김수현, 김재필, 황태규 |
| 소속 | 서울대 |
| 키워드 | UV absorber; ESIPT; benzotriazole |
