화학공학소재연구정보센터
학회 한국공업화학회
학술대회 2019년 가을 (10/30 ~ 11/01, 제주국제컨벤션센터(ICC JEJU))
권호 23권 2호
발표분야 포스터_정밀화학
제목 Synthesis and characterization of dimeric benzotriazole derivatives for highly durable UV absorber.
초록 Ultraviolet (UV) absorber is one of the effective ways to prevent polymer photodegradation. However, commercial UV absorbers have low thermal stability and are difficult to apply to polymers that require a high-temperature process. To improve this drawback, we synthesized highly durable UV absorbers based on hydroxyphenyl benzotriazole.The synthesized UV absorbers (PBT, DSBT, DPBT) are dimers using a linker moiety (disulfide, phenyl, biphenyl). The dimers increased the thermal stability by increasing the molecular weight, but the solubility decreased. The transmittance of the UV absorber + Polyimide(PI) films baked at 250℃ was measured to verify the thermal and light stability of UV absorber in the films. As a result, the dimeric UV absorbers + PI film had higher thermal and light stability than monomeric UV absorber + PI film. In this study, we synthesized and characterized dimeric UV absorbers and showed that the UV absorbers could apply to PI films in a high-temperature process.
저자 김수현, 황태규, 김재필
소속 서울대
키워드 photodegradation; UV absorber; hydroxyphenyl benzotriazole
E-Mail