| 학회 |
한국공업화학회 |
| 학술대회 |
2019년 봄 (05/01 ~ 05/03, 부산 벡스코(BEXCO)) |
| 권호 |
23권 1호 |
| 발표분야 |
디스플레이_포스터 |
| 제목 |
Synthesis of uniform SiO2 inorganic fillers of scratch-resistant antiglare film for high resolution displays |
| 초록 |
Uniform SiO2 inorganic fillers were synthesized by using sodium 4-styrene sulfonate (NaSS) anionic surfactant and organic amine base catalyst such as ethylenediamine (EDA) or diethylenetriamine (DETA) in Stöber method. Due to the promoted growth reaction by the EDA and DETA base catalysts, SiO2 particles larger than those produced by ammonia base catalyst could be synthesized. The abundant amine groups as base catalyst are located at the near surface of SiO2 particles so that more basic micro-environment are formed at near surface of SiO2 particles. Hence, the condensation reaction was promoted by the organic amines and consequently larger SiO2 particles were produced. To improve the anti-scratch property of anti-glare (AG) film for high resolution display, we introduced the larger SiO2 particles in the common high resolution AG coating film and could enhance scratch-resistant property. |
| 저자 |
김민진, 임상혁
|
| 소속 |
고려대 |
| 키워드 |
SiO2; high resolution displays
|
| E-Mail |
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