| 학회 |
한국재료학회 |
| 학술대회 |
2011년 가을 (10/27 ~ 10/29, 신라대학교) |
| 권호 |
17권 2호 |
| 발표분야 |
E. Structural Materials and Processing Technology(구조재료 및 공정기술) |
| 제목 |
Deposition of ZnO Films Using Atmospheric Pressure Cold Plasma with Various Discharge Voltages |
| 초록 |
In this study, atmospheric pressure cold plasma was generated stably at various discharge voltages and through excitation of He gas or a mixture of He and O2 gas under open-air. This plasma was examined by optical emission spectroscopy. By feeding Zn-MOPD (C18H30O6Zn) with He carrier gas into the plasma system, transparent flat ZnO thin films were successfully fabricated on glass substrates directly under the slit made into the cathode. The microstructure of the deposited films was observed by FE-SEM. |
| 저자 |
Gi Taek KIM1, Akiou Kawaguchi2, Takehiko Murase3, Koji Yamauchi4, Toshifumi Yuji3, Tomokazu Shikama4, Yoon-Kee Kim3, Yoshifumi Suzaki4
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| 소속 |
1Department of Welding and Production Engineering, 2Han-bat National Univ.. Department of Advanced Materials Science, 3Kagawa Univ., 4Department of Advanced Materials Science |
| 키워드 |
Zinc oxide; Cold plasma; Atmospheric pressure; Deposition
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| E-Mail |
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