학회 |
한국고분자학회 |
학술대회 |
2009년 봄 (04/09 ~ 04/10, 대전컨벤션센터) |
권호 |
34권 1호 |
발표분야 |
기능성 고분자 |
제목 |
Dual Patterning of Gold Nanoparticles by Sequential Functionalization of Block Copolymer Thin Films |
초록 |
Block copolymers (BCP) can be used for pattering dense periodic arrays of nanostructures throughout long-range dimensions by an inexpensive and scalable technique. The micropatterning of nanoparticles (NPs) by the combination of BCP lithography is a novel method to precisely control the alignment of the particles as well as interparticle spacing, applicable to magnetic storage media and flash memory devices. PS-b-PtBA BCP (polystyrene-block-poly(tert-butyl acrylate)) coated on the patterned substrate were sequentially deprotected to give carboxylic acids using acid catalyst and heat treatment. The sequentially produced carboxylic acid patterns (polystyrene-block-poly(acrylic acid) (PS-b-PAA)) were used for the sequential patterning of Au NPs. The dual patterns are expected where Au NPs are aligned onto the specific regions defined by PAA domains due to the greater affinity than either PS or PtBA. The details of evaluations will be described. |
저자 |
우승아, 구세진, 김진백
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소속 |
한국과학기술원 |
키워드 |
Dual Patterning; Gold Nanoparticles; Block Copolymer Thin Films
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E-Mail |
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