| 초록 |
Nanofabrication is an inevitable process in nanoscience and nanotechnology. Compared to conventional photolithography, unconventional lithographic techniques have drawn attention for cost effective, reliable process. However, these techniques are limited in scalability due to the collapse of pre-printed structures during step-and-repeat processes. Here, we propose a new class of high precision temperature–controlled polymeric molds directly amenable to printing process with high resolution and site-specific accuracy. To prove the feasibility of versatile utilization of the polymeric mold, we demonstrated site-selective dewetting and nanoimprint lithography for sub-100 nm scale on a polystyrene thin film. In particular, this work can offer a highly precise spatial controllability for patterning on specific regions, thanks to the perfectly controlled thermal distribution (~243 nm/degC). The proposed strategy allowed us to widen its possibility in patterning technologies and various application fields including large area programmable patterning and manufacturing of semiconductor, transparent electrodes and optically variable security devices. |
