| 학회 | 한국공업화학회 |
| 학술대회 | 2021년 가을 (11/03 ~ 11/05, 대구 엑스코(EXCO)) |
| 권호 | 25권 2호 |
| 발표분야 | 포스터-디스플레이 |
| 제목 | Development of SiOF based (assisted) high moisture barrier thin film by R2R MW-PECVD |
| 초록 | In this study, we deposited SiOF thin film between SiNx thin film layers using the MW PECVD system. SiNx that was deposited by PECVD using SiH4, NH3, and Ar gas is the most popular inorganic moisture barrier materials. To check the moisture properties of SiOF, we deposited SiOF thin film using SiF4, N2O gas. First, we deposited SiOF thin film at several SiF4/N2O ratio. After that, we measured FTIR, XPS, and Aquatran-2 for the physical properties and WVTR properties of SiOF. Second, we deposited 200 and 450 nm thick SiNx thin film and 200/50/200 nm thick SiNx/SiOF/SiNx(NFN) multi-layer by in-situ process. After that, we measured Physical properties using SEM, WVTR property using aquatran-2, and optical properties using UV spectroscopy. From this study, NFN multi-layer using SiOF by R=1 ratio deposition process has high moisture barrier property compared with SiNx single layer. As a result, we showed that SiOF can increase moisture barrier property using the moisture capture effect. |
| 저자 | 엄지호, 조태연, 조성근 |
| 소속 | 한국화학(연) |
| 키워드 | R2R PECVD; SiOF; SiNx; WVTR |
