| 초록 |
Most important factor to make vertically oriented microdomains in block copolymer films is wetting behavior at the interfaces. From this point of view, we studied wetting behavior of P(S-b-MMA) block copolymer thin films on silsesquioxane-based organosilicate substrates. Surface energy of organosilicate substrate could be controlled by thermal treatment and UV treatment. With increasing temperature of thermal treatment, wetting behavior of P(S-b-MMA) film on substrate were changed from symmetric to asymmetric, and we could find neutral wetting conditions. On the other hand, wetting behavior of P(S-b-MMA) films on pre-cured substrate changed from neutral to symmetric after UV treatment on substrate. This tunable substrate can be patterned using masks and UV, and we could observe patterned substrate induced different morphology of P(S-b-MMA) films on exposed/unexposed regions. |
