| 초록 |
Micropatterning of porous silicon films for nanochannel arrays prepared depend on growing thin layer of silicon nitride on the surface of silicon wafers by low-pressure chemical vapour deposition (LPCVD) on silicon substrates. We used a combination of microfabrication and breakdown electrochemical etching to prepare arrays of nanochannels on silicon platforms. -This research was financially supported by the Ministry of Coomerce, Industry and Energy (MOCIE) and Korea Industrial Technology Foundation (KOTEF) through the Human Resource Training Project for Regional Innovation. |
