| 학회 |
한국공업화학회 |
| 학술대회 |
2018년 가을 (10/31 ~ 11/02, 제주국제컨벤션센터(ICC JEJU)) |
| 권호 |
22권 2호 |
| 발표분야 |
나노_포스터 |
| 제목 |
Growth of thin-film by Chemical vapor deposition studied by in-situ raman spectroscopy measurement |
| 초록 |
Chemical vapor deposition is one of the most common processes used to form thin films and metallic or ceramic compounds. It is not possible to analyze defects or cracks which occur during the growth process of the thin film, and to analyze non-uniform growth and proper thin film growth performance. In this study, we used a chemical vapor deposition device and in-situ Raman spectroscope to observe the growth behavior of the thin film during the CVD process. And also we compared differences between data from in-situ and those from normal atmosphere. |
| 저자 |
전재성1, 허훈1, 김재훈1, 유은성1, 소대섭2, 정대용3
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| 소속 |
1한국생산기술(연), 2한국과학기술정보(연), 3인하대 |
| 키워드 |
CVD; Ramanspectroscopy; Thinflim;
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| E-Mail |
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