| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 | 29권 2호, p.614 |
| 발표분야 | 기능성 고분자 |
| 제목 | Synthesis and Characterization of Alkali Developable Positive Type Photosensitive Polyimide for Colorless Interlayer Insulator in TFT-LCD Device |
| 초록 | Polyimides have been widely used in microelectronic devices. Recently, photosensitive polyimides(PSPIs) have attracted lots of attention because they simplify processing steps and their own advantages such as excellent thermal property, good mechanical property and electrical property, etc.1 In this study, the colorless polyamic acid (PAA) was prepared from cyclobutane-1,2,3,4 -tetracarboxylic dianhydride (CBDA) and 4,4'-oxydianiline (ODA). In order to impart photosensitivity to the PAA, DNQ(diazonaphthoquinone) derivative was added. However, the DNQ derivative did not have enough power to inhibit the dissolution in aqueous-base solution. Therefore, we had synthesized polyamic acid ester by adding 1,2-epoxy-3-phenoxypropane to the PAA. That is, the acidity of PAA was controlled by the introduction of 1,2-epoxy-3-phenoxypropane. Through the control of the acidity, the process of low temperature like 90℃ was possible during the post-exposure baking(PEB). Then, the significant difference of dissolution rate between the exposed and unexposed area was observed at the acid content of 60 % and less. The resolution of the positively patterned PSPI film showed about 25㎛ and the exposure dose was 200 mJ/cm2.(Fig.1) In addition, we could find that the transmittance was increased above 90% by photo-bleaching after PEB. (Fig.2) Fig. 1. Surface profile of patterned polyamic acid ester Fig. 2. Effect of photo-bleaching 참고문헌 1. Yasufumi Watanabe, Yuji Shibasaki, shinji Ando, Chem. Mater., 14, 1762-1766, 2002 |
| 저자 | 심현보1, 이미혜1, 김경준2, 홍성권3 |
| 소속 | 1한국화학(연), 2(주) LG화학, 3충남대 |
| 키워드 | PSPI; LCD; photosensitive; polyimide; positive; insulator |
