| 초록 |
Silicon-containing photoresists (PRs) are gaining increasing interest for the imaging layer in bilayer system. However, the PRs for the imaging layer have to contain several functional materials in the copolymer for dry etch resistance, solubility change, and adhesion. Therefore, the design of PRs is relatively difficult and has the limits. In this study, we propose the blending method of PRs containing photoactive diazo-groups and amine-functionalized silicon material to adjust easily the properties of the imaging layer. The details of results will be described. |
