| 학회 |
한국고분자학회 |
| 학술대회 |
2018년 가을 (10/10 ~ 10/12, 경주컨벤션센터) |
| 권호 |
43권 2호 |
| 발표분야 |
고분자구조 및 물성: 극한물성소재 |
| 제목 |
Evaluating the moisture-barrier properties of aluminum oxide thin films under influence of purging step in atomic layer deposition techniques |
| 초록 |
With the abilities of precise thickness control, excellent step coverage and conformal deposition, atomic layer deposition (ALD) technique is considering as a promising surface coating technology. However, ALD process is very time-consuming, this drawback is relevant directly to purging parameter. Commonly, the shortest purge-time with ensuring the quality of Al2O3 layer is desired. In this study, Al2O3 thin films were prepared using ALD technique at different purging-times of trimethylaluminum (TMA) and ozone. The effects of the purging-time on the growth and moisture-barrier properties of resulting Al2O3 thin films were investigated via SEM, AFM, UV-Vis and WVTR test. |
| 저자 |
Thu Nguyen1, 김재호2, 김성희2, 이준영2
|
| 소속 |
1Sungkyunkwan Univ., 2성균관대 |
| 키워드 |
purging time; aluminum oxide
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| E-Mail |
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