| 초록 |
Here, we report ultra-high resolution directed self-assembly of sub-5 nm nanoparticles by inexpensive and facile approach using block copolymer template. A high-chi, silicon containing block copolymer, poly(dimethylsiloxane)-b-poly(styrene) is selected due to high template resolution of sub-10 nm. When microphase separated nanopattern of the block copolymer is treated with plasma, silica nanotemplate with topographical contrast is obtained on which 4 nm sized CdSe quantum dot nanoparticles are spin coated and arranged via capillary force assisted self-assembly. Particles are arranged in template domains with lower topographical contrast with high fidelity. The strategy of providing ultra-high resolution topographical template by cheap and facile approach using block copolymer self-assembly can narrow down the gap between feasibility and the actual utilization of nanoparticles with unique material properties. |
