| 초록 |
In the past decade, the design and fabrication of hollow nanostructures has been of considerable interest due to their promising applications in biomedicine, optics and environmental catalysis, among which silica or silicon-based hollow spherical nanoparticles have been one of the hottest focuses because of their high surface area and pore volume, and facile surface modification and multifunctionalization. Thus, we report a facile method to fabricate hollow silica and silicon nanoparticles via wet etching and reduction-diffusion process. The strategy employing wet etching combined with solid reduction method for hollow nanostructures would provide the opportunities to enlarge the application areas. |
