초록 |
Various methods for Optical Fourier Surfaces have been proposed to develop augmented reality (AR) applying diffractive optics. The process of lithographic photochemical reactions and etching is one of the currently dominating methods for manufacturing OFSs but digitalized binary reliefs fabricated through this process are not close to the ideal surface profile of OFSs. While scanning probe lithography (SPL) is an exceptional method that can mimic the ideal surface profile of OFSs, the pattern generated via SPL is confined to a relatively small area due to the serial steps of fabrication, which also requires to use of unnecessary or impractical Fourier Spectrum. In order to overcome these limitations, this article suggests a redesigned prototype for the low-cost, large-area, and rapid OFSs fabrication. Numerical design, material optimization, and proper optical processing are integratively discussed to substantiate the performance and quality of the newly developed OFSs. |