| 초록 |
The tertiary butyl groups have been widely used for chemically amplified photoresists. However, the polymers with those groups release the volatile byproduct, isobutene, by acid-catalyzed deprotection reaction. The polymers with the tertiary caprolactone groups do not produce volatile byproducts during the deprotection reaction because those groups are cyclic lactone. Therefore, those polymers can be used for low-outgassing photoresists. A novel methacryl monomer containing tertiary caprolactone was synthesized. From camphor, a tertiary lactone was synthesized through Baeyer-Villiger oxidation. The lactone was reacted with methacrylic acid to produce the monomer. |
