| 초록 |
Nylon can be used as a membrane material due to its high polarity and solvent resistance. In semiconductor industry, filtering process should be applied in order to maintain high quality of pattern. Point-of-use filter has been used for reduce defect. Microbridge defect resulted from various reasons such as hard particles and soft particles. Hard particles may be inorganic metals of Fe or Cu. Soft particles may be gel-like agglomerates from polymers and inorganic metals. The hard particles can be removed by size exclusion. However, soft particles cannot be removed by size exclusion. Instead, the soft particles can be removed by adsorption in polar membrane. In this study, nylon membrane was fabricated by vapour-induced phase separation method. Pore size and membrane morphology were evaluated. The mean pore size of the membrane was 70 nm, and cross-sectional view showed that the membrane has a potential to retain soft particles. |
