| 초록 |
The roll-to-roll (R2R) nanoimprint lithography (NIL) system is a process that can precisely pattern micro/nano-scale patterns over a large area. In this study, a step-and-repeat imprinting system applied with a precision alignment system was developed to fabricate a 300 mm ×1000 mm large-area flexible mold with a fine pattern. In order to fabricate pattern roll using a large-area mold, a flexible mold winder capable of precise position control and tension control was developed. Finally, the fabricated pattern roll was applied to the R2R NIL system to perform several application tests such as simple test patterns, super-hydrophobic films, and anti-counterfeiting holographic patterns. |
