| 학회 |
한국공업화학회 |
| 학술대회 |
2021년 봄 (05/12 ~ 05/14, 부산 벡스코(BEXCO)) |
| 권호 |
25권 1호 |
| 발표분야 |
[콜로이드·계면화학] 콜로이드 계면화학의 최신 연구 및 개발 동향 |
| 제목 |
Introduction of BARC and UL for Photolithographic Process: Optical and Chemical Interactions at Interfaces of Polymer Thin Films |
| 초록 |
In the photolithography process for semiconductor device manufacturing, BARC (Bottom Antireflective Coating) has been adopted where photoresists cannot be directly patterned on semiconductor substrates due to shrinkage of critical dimensions in the latest devices. In this presentation, we will introduce BARC materials critical for better process margin and pattern profiles in nano-patterning of photoresists. It will include basic operative principles to minimize substrate reflectivity and design concepts for appropriate BARC materials based on optical and chemical interactions at the photoresist–BARC interface. Advanced BARCs are highly demanded to overcome technical challenges related to substrate reflectivity, dry etch rate, gap fill and wet etch resistance. We will also review the design and development of BARCs with specific applications for advanced patterning. |
| 저자 |
Jae Hwan Sim, 이정준, 안재윤, 임수정, 강유진, 정기정, 김수웅, 배영은, 임재봉
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| 소속 |
DuPont Korea Technology Center |
| 키워드 |
Photolithography; BARC
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| E-Mail |
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