| 학회 | 한국고분자학회 |
| 학술대회 | 2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 | 28권 1호, p.378 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Overcoming the height limit of vertically oriented cylindrical microdomains in block copolymer thin film |
| 초록 | Vertically oriented cylindrical microdomains in block copolymer thin films consisting of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) were prepared on a neutrally interacting surface. The block copolymers were synthesized by anionic polymerization (AP) or atom transfer radical polymerization (ATRP). The vertical orientation of block copolymers by ATRP was achieved up to its 5 times lattice spacing, in contrast only one lattice spacing was possible with block copolymers by AP. When homopolymers miscible with PMMA cylindrical domain were added the possible height of vertical orientation of cylindrical domains was slightly decreased, but still over than 4 times lattice spacing of the neat block copolymer. The lattice spacing of neat block copolymers by ATRP gradually decreased as the film thickness increased and reached a steady value which is the same with lattice spacing of bulk sample. The lattice spacing of mixture samples on the film thickness rapidly decreased and reached their values of bulk samples when the thickness is over about 80 nm. This work was supported by National RND Program (M1-0214-00-0230) by MOST, the Korea Research Foundation (KRF-2002-05-D00008). |
| 저자 | 정운용;류두열;고동한;김진곤;Thomas P. Russell |
| 소속 | 포항공대 화공과;포항공대 화공과;포항공대 화공과;포항공대 화공과;U. Mass |
| 키워드 | block copolymer; thin film; nano membrane |
