| 학회 | 한국재료학회 |
| 학술대회 | 2013년 봄 (05/23 ~ 05/24, 여수 엠블호텔(THE MVL)) |
| 권호 | 19권 1호 |
| 발표분야 | A. 전자/반도체 재료(Electronic and Semiconductor Materials) |
| 제목 | Effect of atomic layer deposited ZnO layers on the electrodeposition and photoelectric properties of Cu2O films |
| 초록 | Cuprous oxide (Cu2O) is an attractive material as absorber layers of photovoltaic devices, because it has direct band gap energy of 2.1 eV and high absorption coefficient, which make it possible to fabricate thin film solar cells. Up to date, the Cu2O absorber layers have been prepared by several techniques such as Cu thermal oxidation, sputtering, and electrodeposition. Among these methods, electrodeposition is particularly attractive process because of its simplicity, scalability, and economy. In this study, we electrodeposited the Cu2O layers on the ITO/glass substrates coated with Zinc Oxide (ZnO) by using the atomic layer deposition (ALD) to control the resistivity of substrate easily. Resistivity of ZnO is controlled by ALD deposition temperature; 100, 125, and 150. Solution pH was controlled 11.0, by using 4 M sodium hydroxide solution. The electrodeposition was potentiostatically carried out at - 0.4 V and 333 K. And then, Ni and Au bilayers were deposited by e-beam evaporator on the Cu2O as an electrode to confirm the effect of resistivity of ZnO substrate on I-V characteristics. The properties of Cu2O thin films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM). The Cu2O/ZnO heterostructures with the Cu2O layers synthesized on the low conductive ZnO substrate showed ohmic behavior, and the heterostructures prepared by the high conductive ZnO substrate showed rectifying behavior. Photocurrent characterization was performed to confirm the conduction type of each sample. And it is expected that the change of electrical properties is related to the formation of CuO and Cu2O phases, and thus optical absorption study was carried out to confirm the absorption edge of samples. |
| 저자 | 백승기, 권용현, 조형균 |
| 소속 | 성균관대 |
| 키워드 | Cuprous oxide; Electrodeposition; Atomic layer deposition; Zinc oxide |
