화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터)
권호 41권 1호
발표분야 기능성 고분자
제목 Photosensitive material in patterning for positive-tone photoresists
초록 A conventional PSPBO can be consisted of photo active compound(PAC), esterified diazonaphthoquinone(DNQ) and PBO precursor, PHA(polyhydroxyamide). The PHA has phenolic hydroxyl group, so that can promote dissolution of the polymer in an aqueous alkaline developer. The hydrogen bonds between hydroxyl group of PHA and DNQ inhibit the dissolution. But, after exposure with UV light, DNQ is converted to indene-carboxylic acid or sulfonic acid compounds which promote dissolution. Because of this phenomenon, the PHA can be used to prepare a positive working photosensitive material in patterning processes.
저자 곽영준, 이승우, 손석호, 석웅철, 김기승
소속 영남대
키워드 polybenzoxazole; positive
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