| 초록 |
Tin oxides (SnOx) have been researched in various applications such as gas detective materials, transparent electrodes, transparent device, and solar cells. Among SnOx p-type SnO is one of the promising transparent oxide semiconductors because of its high optical transparency and excellent electrical properties. In this study, we have fabricated p-type SnO thin film using rf magnetron sputtering with SnO/Sn composite target, and examined the effects of various oxygen flow rates on SnO thin films. Also, we fundamentally investigated the structural, optical, and electrical properties of p-type SnO thin films utilizing X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), UV/Vis spectrometer, and Hall effect measurement. The influence of the oxygen flow rate on tin oxides deposited by sputtering with SnO/Sn composite target will be discussed in detail. |
