| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 | 29권 2호, p.638 |
| 발표분야 | 기능성 고분자 |
| 제목 | Nanopatterning of photonic crystal with photocurable high refractive index material by UV-based nanoimprint technique |
| 초록 | Nanoimprint lithography has received considerable interest because of recently demonstrated potentials for low cost, high-resolution lithographic technologies. By avoiding the use of expensive light sources and projection optics, tools for imprint lithography realize a reduction in cost and this offers the promise of dramatically reduced cost of ownership for the lithography tools and therefore the manufacturing plant as a whole.1,2 UV-based nanoimprint technique has been developed as an attractive to hot embossing technology.3,4 We report on the experimental results of UV-based nanoimprinted photonic crystal structure and synthesis of photocurable high refractive index materials. We are investigated a high-resolution printing technique based on transferring a pattern from an elastomeric stamp to a solid substrate by UV-based nanoimprinting technique. This is an attempt to enhance the accuracy of classical printing to a precision comparable with optical lithography, creating a low-cost, high-resolution patterning process. This report is to provide a cost-efficient technique based on UV nanoimprint technology and high refractive index materials for the fabrication of polymeric photonic crystal nanostructures. In conclusion, the high refractive index organic-inorganic hybrid materials (HYBRIMERs) for photonic crystal structures were successfully synthesized by non-hydrolytic sol-gel process. This HYBRIMER has low absorption loss and very low birefringence. The nanoimprinting with the UV-based technique was employed to fabricate the HYBRIMER thin film with photonic crystal nanostructures. The original nanostructures of master are nicely replicated to HYBRIMER thin films. Thus the UV-based nanoimprint technique can be expected to be an efficient way to fabricate nanostructures polymeric photonic crystal, which is undoubtedly a very promising route for optics technologies. Furthermore experimental work aiming at fabricating of photonic crystal devices is currently under way in our laboratory. We will report the optical properties of photonic crystal waveguides in the near future. Fig. 1. Oligomeric structure of high Fig. 2. AFM image of imprinted nanostructure refractive index materials by UV-based nanoimprint technique References 1. Y. Xia, J.A. Rogers, K.E. Paul, G.M. Whitesides, Chem. Rev. 99, 1823 (1999) 2. S.Y. Chou, P.R. Krauss, W. Zhang, L. Guo, L. Zhuang, J. Vac. Sci. Technol. A, 15, 2897(1997) 3. J. Haisma, M. Verheijen, K.v.d. Heuvel, J.v.d. Berg, J. Vac. Sci. Technol. B, 14, 4124 (1996) 4. M. Bender, M. Otto, B. Vratzov, B. Spengenberg, H. Kurz, Macromolelectron. Eng. 53, 233 (2000) |
| 저자 | 윤근병 |
| 소속 | 한국전자통신(연) |
| 키워드 | Photonic Crystal; nanoimprint; High refractive index |
