| 초록 |
The current block copolymer (BCP) nanotechnology has been extended to combine with various external processing factors, such as lithographic patterns, electric fields, solvent or zone annealing, and geometrical confinement, either for fabricating defect-free structure or for creating novel structures with pursuing novel applications. As a prime example, chemoepitaxy or graphoepitaxy using chemical or topographical template can direct BCP self-assembly effectively into a desired patterned structure with enhanced orientational and translational order. This presentation will provide theoretical investigations on graphoepitaxial assembly of BCPs guided by tetragonally arrayed pillar pattern. The pattern tunability and the dimensional variability will be presented by demonstrating theoretical and simulation results for this directed self-assembly system. |
