| 학회 | 한국고분자학회 |
| 학술대회 | 2002년 가을 (10/11 ~ 10/12, 군산대학교) |
| 권호 | 27권 2호, p.13 |
| 발표분야 | 특별 심포지엄 |
| 제목 | Control of Block Copolymer Microdomain Patterns for Nanotechnology |
| 초록 | Nanometer scale pattern structures based on self assembly have been considered for alternatives to replace high resolution lithographic technologies such as X ray, electron beam and interference lithographys. In particular synthetically achievable block copolymers have been paid much attention thanks to not only the scale of microdomains (tens of nanometers) but also convenience to tune the size of microdomains with changing their molecular weights. Many potential usages of block copolymers for different nanotechnologies have been proposed. However the main drawback of using block copolymers lies on difficulty of their microstructure control. Achievement of orientation and further control of microstructures of block copolymers requires introduction of external fields which can couple to material systems. Two processes and their combination involving new types of interactions with block copolymer microdomains (such as epitaxy and directional solidification) are introduced. The first process is epitaxy whereby a crystallizable organic solvent (such as benzoic acid and anthracene) serves as a solvent for a semicrystalline block copolymer at temperatures above the solvent melting temperature and becomes substrate onto which the crystallizable block can orient when the block is cooled below its melting point. The second process involves directional solidification of the crystallizable solvent which induces overall orientation of the block copolymer Inter Material Dividing Surface (IMDS) parallel to the temperature gradient. When a block copolymer which contains a crystallizable block is used, one can also utilize epitaxy in combination with directional solidification to control the microdomain pattern. Controlled microdomain structures are utilized for further engineering applications. Directional solidification of block copolymer and crystallizable organic solvent is performed on the topographically pre-patterned silicon oxide substrate. Subsequent oxygen plasma reactive ion etching selectively removes microdomains for nanolithographic template. In addition, quantum dots are sequestered in a semicrystalline block copolymer thin film epitaxially crystallized on anthracene single crystal. |
| 저자 | 박철민 |
| 소속 | 연세대 |
| 키워드 | block copolymer; nanotechnology; pattern |
| VOD | VOD 보기 |
