| 학회 |
한국고분자학회 |
| 학술대회 |
2003년 봄 (04/11 ~ 04/12, 연세대학교) |
| 권호 |
28권 1호, p.351 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
PHOTOPOLYMERIZATION OF STRUCTURALLY DESIGNED AMPHIPHILIC DIACETYLENE DERIVATIVES AND ITS APPLICATION TO PHOTOLITHOGRAPHY |
| 초록 |
Several structrurally designed amphiphilic molecules containing long diacetylenes (DAs) alkyl chains and diacid groups have been designed and synthesized. These monomers structures have been investigated by NMR, FT-IR, UV-vis spectroscopy, DSC, TGA, XRD. These analyses for the DA monomers showed that they exhibited very good layer-like structures and packed by hydrogen bonding between the acid groups. UV-induced photopolymerization of all these monomers in spin-coated films has also been studied. The color changed from Blue to red when the irradiation time was increased. Longer flexible alkyl spacer was benefit to the stacking of DA functional groups. By protecting these DAs selectively with a photomask upon UV exposure, high-resolution photolithographic micropatterns can be obtained by dissolving unreacted monomers. |
| 저자 |
Zhongzhe Yuan;Chan-Woo Lee;Suck-Hyun Lee |
| 소속 |
AJOU Univ.;AJOU Univ.;AJOU Univ. |
| 키워드 |
diacetylene; photopolymerization
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| E-Mail |
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