화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO))
권호 40권 2호
발표분야 고분자구조 및 물성
제목 Solventless Processible and Directly Photo-patternable Gate Dielectrics for Top-Gate OFETs
초록 Compared to bottom-gate OFETs, top-gate OFETs have been less widely used due to their difficulties in depositing gate dielectrics using solution processes without harming the underlying organic semiconductors. In this study, we developed solventless processible and direct photo-patternable gate dielectric system. Viscous liquid of a mercapto-functionalized poly[(mercaptopropyl)methylsiloxane] and alkene-containing molecule were spin-coated along with a photo-initiator, and cured by thiol-ene reaction through UV irradiation at 365 nm. The dielectric constant and leakage current of the dielectric film were measured via device fabrication of capacitor, showing good electrical properties as a gate dielectric. The solventless processible gate dielectric system can be successfully applied to the top-gate OFETs using both small molecule and polymer semiconductor. Pattern replication was also successfully demonstrated through conventional photolithographic methods.
저자 곽영제, 김도환, 권준선
소속 숭실대
키워드 gate dielectric; top-gate OFET; photolithography
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