| 학회 |
한국공업화학회 |
| 학술대회 |
2017년 가을 (11/08 ~ 11/10, 부산 벡스코(BEXCO)) |
| 권호 |
21권 2호 |
| 발표분야 |
우수논문(구두)_박사과정 |
| 제목 |
Flexible and Robust Superomniphobic Surfaces Created by Localized Photofluidization of Azopolymer |
| 초록 |
Springtails possess robust omniphobic skins with doubly re-entrant structures (DRS). Although omniphobic surfaces are promising for various applications, it remains an important challenge to mimic the structural feature of springtails. This paper presents a pragmatic method to create DRS and robust super-omniphobic surfaces by exploiting localized photofluidization of azopolymers. Irradiation of circularly-polarized light reconfigures azopolymer pillars to have a mushroom-like head with a DRS through protrusion and inward bending of polymer film from the top edge. The unique geometry exhibits super-omniphobicity even for liquids whose equilibrium contact angles are almost zero in the presence of a practical level of external pressure. The simple fabrication process is highly reproducible, scalable, and compatible with various substrate materials. Our results suggest that our photofluidization technology will provide a practical route to create robust super-omniphobic surfaces. |
| 저자 |
최재호, 김희탁, 김신현
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| 소속 |
카이스트 |
| 키워드 |
Superomniphobic; doubly re-entrant geometry; localized photofluidization; azopolymer; micro/nanopatterning
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| E-Mail |
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